This Sputtering Target features a Zirconium (Zr) composition with 99.5% purity, making it ideal for high-quality thin film deposition. The target measures 13.505 inches in diameter and 0.250 inches in thickness.
- Material: Zirconium (Zr)
- Purity: 99.5%
- Diameter: 13.505 inches
- Thickness: 0.250 inches
- Condition: Used
Perfect for applications in semiconductor and optical coatings, this sputtering target ensures excellent film quality and uniformity. Its high purity level is essential for achieving optimal performance in various deposition processes.
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