The VEM Mo Sputtering Target is a high-purity material designed for sputtering applications. With a purity of 99.995% and dimensions of 13.505 inches in diameter and .250 inches thick, this target is ideal for thin film deposition.
- Brand: SPUTTERING
- Type: Sputtering Target
- Material: Molybdenum
- Purity: 99.995%
- Dimensions: 13.505'' x .250''
Perfect for use in semiconductor and materials science applications, this target ensures high-quality results and is essential for advanced manufacturing processes.
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